Low-Temperature and Low-Activation-Energy Process for the Gate Oxidation of Si Substrates

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-15

著者

• Ueno Tomo

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• Ueno Tomo

  Tokyo University Of Agriculture And Technology

• Morioka Ayuka

  Tokyo University Of Agriculture And Technology

• CHIKAMURA Shingo

  Tokyo University of Agriculture and Technology

• IWASAKI Yoshitaka

  Tokyo University of Agriculture and Technology

関連論文

• Low-Temperature and Low-Activation-Energy Process for the Gate Oxidation of Si Substrates
• Complex Nature of Acceptor Levels in Aluminum Gallium Nitrides Doped with Magnesium : Semiconductors
• Electrical Properties of Germanium Oxynitride and Its Interface with Germanium Prepared by Electron-Cyclotron-Resonance Plasma Oxidation and Nitridation

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