Thermal Stability and Oxidation Resistance of W, TiW, W(N)and TiW(N)Thin Films Deposited on Si
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-11-15
著者
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Chang C
Academia Sinica Taipei Twn
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Chao Lan
Vanguard International Semiconductor Corporation
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Huang Chun
Department Of Material Science And Engineering National Tsing Hua University
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Wu Tai
Department Of Material Science And Engineering National Tsing Hua University
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CHANG Chich
Department of Material Science and Engineering, National Tsing Hua University
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SHIH Wong
Vanguard International Semiconductor Corporation
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Chang Chich
Department Of Material Science And Engineering National Tsing Hua University
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Huang Chun
Department of Chemical Engineering and Materials Science, Yuan Ze Fuel Cell Center, Yuan Ze University, 135 Yuan-Tung Road, Chungli, Taiwan 32003, R.O.C.
関連論文
- Thermal Stability and Oxidation Resistance of W, TiW, W(N)and TiW(N)Thin Films Deposited on Si
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