Dielectric and Electrical Characteristics of Titanium-Modified Ta_2O_5 Thin Films Deposited on Nitrided Polysilicon by Metalorganic Chemical Vapor Deposition
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-15
著者
-
Chang C
Academia Sinica Taipei Twn
-
Chao Lan
Vanguard International Semiconductor Corporation
-
Wu Tai
Department Of Material Science And Engineering National Tsing Hua University
-
CHANG Chich
Department of Material Science and Engineering, National Tsing Hua University
-
SHIH Wong
Vanguard International Semiconductor Corporation
-
Chang Chich
Department Of Material Science And Engineering National Tsing Hua University
関連論文
- Thermal Stability and Oxidation Resistance of W, TiW, W(N)and TiW(N)Thin Films Deposited on Si
- Dielectric and Electrical Characteristics of Titanium-Modified Ta_2O_5 Thin Films Deposited on Nitrided Polysilicon by Metalorganic Chemical Vapor Deposition
- Preferred CDRH3 lengths for antibodies with defined specificities