Metal-Organic Chemical Vapor Deposition and Characterization of Strontium Bismuth Tantalate(SBT)Thin Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-09-30

著者

• Mcmillan L

  Symetrix Corporation

• Mcmillan Larry

  Symetrix Corporation

• Araujo Carlos

  Symetrix Corporation

• Otsuki Tatsuo

  Panasonic Technologies Inc.

• Schumacher Marcus

  Aixtron K. K.

• Lindner Johannes

  AIXTRON K. K.

• Solayappan Narayan

  Symetrix Corporation

• BURGESS Darren

  AIXTRON AG, Kaeckerstr.

• SCHIENLE Frank

  AIXTRON AG, Kaeckerstr.

• LINDNDR Johannes

  AIXTRON AG, Kaeckerstr.

• JUERGENSEN Holger

  AIXTRON AG, Kaeckerstr.

• UCHIYAMA Kiyoshi

  Panasonic Technologies Inc.

• Burgess Darren

  Aixtron Ag Kaeckerstr.

• Schienle Frank

  Aixtron Ag Kaeckerstr.

• Juergensen Holger

  Aixtron Ag Kaeckerstr.

関連論文

• Application of Ferroelectric Thin Films to Si Devices (Special Issue on Quarter Micron Si Device and Process Technologies)
• Atomic Vapor Deposition of SBT and Electrode Materials
• Metal-Organic Chemical Vapor Deposition and Characterization of Strontium Bismuth Tantalate(SBT)Thin Films
• Preparation of Ferroelectric Thin Films of Bismuth Layer Structured Compounds

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