Lateral Epitaxial Growth in Poly-Si Film over SiO_2 from Single-Si Seed by Scanning CW Ar Laser Annealing

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-03-05

著者

• Sakurai Junji

  Fujitsu Limited

• KAWAMURA Seiichiro

  Fujitsu Limited

• MORI Haruhisa

  Fujitsu Limited

• NAKANO Motoo

  Fujitsu Limited

関連論文

• Lateral Epitaxial Growth in Poly-Si Film over SiO_2 from Single-Si Seed by Scanning CW Ar Laser Annealing
• Advantages of Ultra-Thin SIMOX/CMOS based on Well-Established 0.8 μm Mass-Production Technologies for Low Power 1 V Phase Locked Loop Circuits
• Influence of Grown-in Hydrogen on Thermal Donor Formation and Oxygen Precipitation in Czochralski Silicon Crystals

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