Frequency Effect on Material Selectivity in Gas Plasma Etching in Planar Type Reactor

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-03-05

著者

• Komiya Hiroyoshi

  Lsi Research And Development Laboratory Mitsubishi Electric Corporation

• Komiya Hiroyoshi

  Lsi Research And Development Laboratory Mitsubishi Electric Corporation Mizuhara

• Toyoda Hiroyasu

  Computer Development Laboratories Limited

• TOBINAGA Mineto

  Computer Development Laboratories Limited

関連論文

• Frequency Effect on Material Selectivity in Gas Plasma Etching in Planar Type Reactor
• Etching of SiO_2 in CF_4 Gas Plasma Using Planar-Type Reactor
• Plasma Etching of SiO_2 Relief Having Tapered Wall

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