1:4 Demagnifying Electron Projection System : A-1: ADVANCED LITHOGRAPHY AND PROCESS
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-04-30
著者
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Migitaka Masatoshi
Cooperative Laboratories Vlsi Technology Research Association
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Asai Takayuki
Cooperative Laboratories Vlsi Technology Research Association
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ITO Shin-ichi
Cooperative Laboratories, VLSI Technology Research Association
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ETO Toshio
Cooperative Laboratories, VLSI Technology Research Association
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Eto Toshio
Cooperative Laboratories Vlsi Technology Research Association
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Ito Shin-ichi
Cooperative Laboratories Vlsi Technology Research Association
関連論文
- Fabrication of Submicron Pattern with an EB Lithographic System Using a Field Emission (FE) Electron Gun
- Proximity Effect in an EB Lithographic System Using a Field Emission (FE) Electron Gun
- 1:4 Demagnifying Electron Projection System : A-1: ADVANCED LITHOGRAPHY AND PROCESS