Proximity Effect in an EB Lithographic System Using a Field Emission (FE) Electron Gun
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-09-05
著者
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Hosaka Sumio
Cooperative Laboratories Vlsi Technology Research Association:(present Address) Central Research Lab
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Hayakawa Hajime
Cooperative Laboratories Vlsi Technology Research Association:(present Address) Device Development C
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Migitaka Masatoshi
Cooperative Laboratories Vlsi Technology Research Association:(present Address) Central Research Lab
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Migitaka Masatoshi
Cooperative Laboratories Vlsi Technology Research Association
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ICHIHASHI Mikio
Cooperative Laboratories, VLSI Technology Research Association
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NISHI Sadaaki
Cooperative Laboratories, VLSI Technology Research Association
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Nishi Sadaaki
Cooperative Laboratories Vlsi Technology Research Association:(present Address) Present Address: Sys
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Ichihashi Mikio
Cooperative Laboratories Vlsi Technology Research Association:(present Address) Central Research Lab
関連論文
- Fabrication of Submicron Pattern with an EB Lithographic System Using a Field Emission (FE) Electron Gun
- Proximity Effect in an EB Lithographic System Using a Field Emission (FE) Electron Gun
- 1:4 Demagnifying Electron Projection System : A-1: ADVANCED LITHOGRAPHY AND PROCESS