Selective Oxide Coating of Silicon Gate (SELOCS) : A-4: DEVICE TECHNOLOGY (1)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1979-03-01

著者

• Sunami Hideo

  Central Research Laboratory Hitachi Ltd.

• Koyanagi Mitsumasa

  Central Research Laboratory Hitachi Ltd.

関連論文

• Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing : A-3: LASER ANNEALING/SOS DEVICES
• Novel High Density, Stacked Capacitor MOS RAM : A-1: MOS DEVICE AND LIST (1)
• Generation of Dislocations Induced by Chemical Vapor Deposited Si_3N_4 Films on Silicon
• Selective Oxide Coating of Silicon Gate (SELOCS) : A-4: DEVICE TECHNOLOGY (1)
• Dynamic Injection MNOS Memory Devices : A-5: MEMORY DEVICES

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