Microwear of Silicon Surfaces

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概要

• 論文の詳細を見る

• A silicon surface and a diamond-like carbon film were scanning scratched in the air. The silicon surfaces scratched with a light load upheaved immediately. This upheaval represents the pre-stage of wear. The silicon surface depressed by heavier scratching began to upheave after some time. This implies that the surface was activated by scratching and adsorbed molecules in the air.

• 社団法人応用物理学会の論文
• 1995-06-30

著者

• KANEKO Reizo

  NTT Applied Electronics Laboratories

• ANDOH Yasuko

  NTT Integrated Information & Energy Systems Laboratories

• Andoh Yasuko

  Ntt Interdisciplinary Research Laboratories

• Kaneko Reizo

  Ntt Advanced Technology Corp.

関連論文

• Ion-Implanted Diamond Tip for a Scanning Tunneling Microscope
• Charge Dissipation on Chemically Treated Thin Silicon Oxide in Air
• Wear Durability and Adhesion Evaluation Methods for Ultrathin Overcoat Films by Atomic Force Microscopy
• Dynamic Analysis of Flying Head Sliders with Ultra-Thin Spacing Based on the Boltzmann Equation : Comparison with Two Limiting Approximations
• Microwear of Silicon Surfaces
• Macro- and Micro-Tribological Properties of Polished CVD Diamond Films and Trial Processing of Diamond
• Charge Dissipation on Chemically Treated Thin Silicon Oxide in Air

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