An Ultrasonic Monitoring of the Sol-Gel Process in Silicon Alkoxide Solutions
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概要
- 論文の詳細を見る
The sol-gel process in silicon alkoxide solutions (TEOS (silicon tetraethoxide)-HCl-H_2O-C_2H_5OH) has been investigated using an ultrasonic longitudinal pulse technique. The process under isothermal conditions was monitored non-destructively and continuously by changes in ultrasonic wave velocity. The velocity changes in the solution was clearly found to depend on the experimental system. In case of open system measurements, the velocity at first increased and slightly decreased after gelation. However in the closed system, the velocity gradually decreased. The velocity difference between the open and closed system would seem to result front the evaporation of solvent, as suggested by changes in the temperature and weight of the solutions used
- 社団法人応用物理学会の論文
- 1995-05-30
著者
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TANAKA Yuko
Department of Materials Engineering Science, Graduate School of Engineering Science, Osaka Universit
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Nagai I
Nagoya Univ. Nagoya Jpn
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Nagai Isao
Department Of Material Physics Government Industrial Research Institute
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Nagai Isao
Department Of Material Physics Osaka National Research Institute Aist
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Matsukawa Mami
Department Of Material Physics Osaka National Research Institute Aist
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Matsukawa Mami
Department Of Electronics Doshisha University
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Takanawa Yasuhiro
Department Of Periodontology And Endodontology Division Of Oral Health Science Hokkaido University G
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Tanaka Y
Department Of Periodontology And Endodontology Division Of Oral Health Science Hokkaido University G
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Tanaka Yuko
Department Of Applied Chemistry Faculty Of Science And Technology Keio University
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