Hierarchy Optimization: A Means to Enhance Efficiency in E-Beam and Optical Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-12-30
著者
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Endo Hiroyuki
Oki Electric Industry Co. Ltd.
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ROSENBUSCH Anja
Sigma-C GmbH, Rosenheimer LandstraBe
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HOFMANN Ulrich
Sigma-C GmbH, Rosenheimer LandstraBe
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KALUS Christian
Sigma-C GmbH, Rosenheimer LandstraBe
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KIMURA Yasuki
OKI Electric Industry Co., Ltd.
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ENDO Akihiro
OKI Electric Industry Co., Ltd.
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Endo Akihiro
Oki Electric Industry Co. Ltd.
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Endo Akihiro
Oki Ekectric Industry Co. Ltd.
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Hofmann Ulrich
Sigma-c Gmbh Rosenheimer Landstrabe
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Kimura Yasuki
Oki Electric Industry Co. Ltd.
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Kalus Christian
Sigma-c Gmbh Rosenheimer Landstrabe
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Rosenbusch Anja
Sigma-c Gmbh Rosenheimer Landstrabe
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Rosenbusch Anja
Sigma-c Gmbh
関連論文
- Hierarchy Optimization: A Means to Enhance Efficiency in E-Beam and Optical Lithography
- A New Approach of E-beam Proximity Effect Correction for High-Resolution Applications
- Sub-Half-Micron I-Line Lithography by Use of LMR-UV Resist : Lithography Technology
- Sub-Half-Micron i-Line Lithography by Use of LMR-UV Resist