Sub-Half-Micron I-Line Lithography by Use of LMR-UV Resist : Lithography Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-12-30

著者

• Yamashita Yoshio

  Oki Ekectric Industry Co. Ltd.

• Endo Akihiro

  Oki Ekectric Industry Co. Ltd.

• Jinbo Hideyuki

  Oki Ekectric Industry Co. Ltd.

• NISHIBU Satoshi

  Fuji Chemicals Industial Co., Ltd

• UMEHARA Hiroshi

  Fuji Chemicals Industial Co., Ltd

• ASANO Takateru

  Fuji Chemicals Industial Co., Ltd

• Asano Takateru

  Fuji Chemicals Industial Co. Ltd

• Nishibu Satoshi

  Fuji Chemicals Industial Co. Ltd

• Umehara Hiroshi

  Fuji Chemicals Industial Co. Ltd

関連論文

• Hierarchy Optimization: A Means to Enhance Efficiency in E-Beam and Optical Lithography
• A New Approach of E-beam Proximity Effect Correction for High-Resolution Applications
• Fabrication of X-Ray Mask Using W-CVD for Forming Absorber Pattern : Lithography Technology
• Fabrication of X-Ray Mask Using W-CVD for Forming Absorber Pattern
• Sub-Half-Micron I-Line Lithography by Use of LMR-UV Resist : Lithography Technology
• Sub-Half-Micron i-Line Lithography by Use of LMR-UV Resist

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