Effects of Substrate-Surface Cleaning on Solid Phase Epitaxial Si Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-07-20
著者
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Tabe Michiharu
Ntt Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation
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KUNII Yasuo
NTT Electrical Communications Laboratories, Nippon Telegraph and Telephone Corporation
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SAKAKIBARA Yutaka
NTT Electrical Communications Laboratories, Nippon Telegraph and Telephone Corporation
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Tabe Michiharu
Ntt Electrical Communication Laboratories
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Kunii Yasuo
Ntt Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation
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Sakakibara Yutaka
Ntt Electrical Communications Laboratories Nippon Telegraph And Telephone Corporation
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Sakakibara Yutaka
Ntt Electrical Communication Laboratories
関連論文
- Effects of Substrate-Surface Cleaning on Solid Phase Epitaxial Si Films
- Oxygen-Doped Si Epitaxial Film (OXSEF)
- Determination of Hydrogen Concentration in PCVD Silicon Nitride Films by Elastic Recoil Detection Analysis