Synthesis of Silicon-Containing Photoresists for ArF Excimer Laser Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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PARK Sang-Jin
Department of Biomedical Science, Graduate School of Agricultural and Life Sciences, The University
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Kim E‐r
Hanyang Univ. Seoul Kor
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Kim Young-dae
Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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Kim Young-dae
Department Of Internal Medicine Dong-a University Hospital
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Kim Young-dae
Department Of Chemistry Hanyang University
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Choi S‐j
Samsung Electronics Co. Ltd. Gyungki‐do Kor
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Park Sang-jin
Department Of Chemistry Hanyang University
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LEE Haiwon
Department of Chemistry, Hanyang University
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KIM Eung-Ryul
Department of Chemistry Hanyang University
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CHOI Sang-Jun
Semiconductor R & D Center, Samsung Electronics
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LEE Si-Hyeung
Semiconductor R & D Center, Samsung Electronics
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Kim Eung-ryul
Department Of Chemistry College Of Natural Science Hanyang University
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Lee S‐h
Semiconductor R & D Center Samsung Electronics
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Lee Haiwon
Department Of Chemistry Hanyang University
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Lee H
Hanyang Univ. Seoul Kor
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Park Sang-jin
Department Of Biomedical Science Graduate School Of Agricultural And Life Sciences The University Of
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Kim Eung-Ryul
Department of Applied Physics, Tokyo Institute of Technology
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