Selective Nucleation-based Epitaxy (SENTAXY): A Novel Approach for Thin Film Formation
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概要
- 論文の詳細を見る
- 1997-03-30
著者
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Yonehara Takao
Canon Inc. Device Development Center
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KUMOMI Hideya
Canon Inc., Device Development Center
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Kumomi Hideya
Canon Inc. Device Development Center:(present Address)canon Inc. R&d Headquarters
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Kumomi Hideya
Canon Inc. Device Development Center
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YONEHARA Takao
Canon Inc., Device Development Center
関連論文
- Selective Nucleation-based Epitaxy (SENTAXY): A Novel Approach for Thin Film Formation
- Selective Nucleation Based Epitaxy(SENTAXY) : A Novel Approach for Thin Film Formation
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- Electronic State of Amorphous Indium Gallium Zinc Oxide Films Deposited by DC Magnetron Sputtering with Water Vapor Introduction
- Scaling of Coplanar Homojunction Amorphous In--Ga--Zn--O Thin-Film Transistors