A Fast Eliminating System of Narrow Electron-Beam Exposure-Figures for Improving Pattern Accuracy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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Terai Masayuki
Manufacturing Technology Division Mitsubishi Electric Corporation
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Kamiyama Kinya
Manufacturing Technology Division Mitsubishi Electric Corporation
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MORIIZUMI Koichi
Manufacturing Technology Division, Mitsubishi Electric Corporation
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NAKAO Hiroomi
Manufacturing Technology Division, Mitsubishi Electric Corporation
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KITADA Osamu
Manufacturing Technology Division, Mitsubishi Electric Corporation
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TAOKA Hironobu
Manufacturing Technology Division, Mitsubishi Electric Corporation
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MIWA Hisaharu
Manufacturing Technology Division, Mitsubishi Electric Corporation
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Nakao Hiroomi
Manufacturing Technology Division Mitsubishi Electric Corporation
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Miwa Hisaharu
Manufacturing Technology Division Mitsubishi Electric Corporation
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Taoka Hironobu
Manufacturing Technology Division Mitsubishi Electric Corporation
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Kitada Osamu
Manufacturing Technology Division Mitsubishi Electric Corporation
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Moriizumi Koichi
Manufacturing Technology Division Mitsubishi Electric Corporation
関連論文
- A Fast Eliminating System of Narrow Electron-Beam Exposure-Figures for Improving Pattern Accuracy
- Precision Improvement in Optical Proximity Correction by Optimizing Second Illumination Source Shape
- A New Rip-Up and Reroute Algorithm for Very Large Scale Gate Arrays (Special Section of Selected Papers from the 9th Karuizawa Workshop on Circuits and Systems)