Anodic Dissolution Behaviour of Si- and Ti-Implanted Iron
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概要
- 論文の詳細を見る
Effects of silicon and titanium ion-implantations on anodic dissolution behaviour of iron have been investigated by multi-sweep cyclic voltammetry in acetate buffer solution (pH〜5), secondary ion mass spectrometry and scanning electron microscopy. Ion-implantations have been carried out with a dose of 1×10^<17> ions/cm^2 at an energy of 150 keV at room temperature. It is found that electrochemical properties of Si^+- and Ti^+-implanted irons are more inert than that of pure iron. Anodic dissolution phenomena of ion-implanted irons are discussed in relation to the shape of an electrochemically corroded surface observed by SEM and to the concentration profiles of implanted atoms measured by SIMS.
- 社団法人応用物理学会の論文
- 1983-03-20
著者
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Iwaki Masaya
The Institute Of Physical And Chemical Research
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Iwaki Masaya
The Institute Of Physical And Chemical Research (riken)
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YOSHIDA Kiyota
The Institute of Physical and Chemical Research
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TAKAHASHI Katsuo
The Institute of Physical and Chemical Research (RIKEN)
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Okabe Y
Department Of Physics Tohoku University
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Yoshida Kiyota
The Institute Of Physical And Chemical Research (riken)
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OKABE Yoshio
Department of Electronic Engineering, Faculty of Engineering, Saitama Institute of Technology
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Okabe Yoshio
Department Of Electronic Engineering Faculty Of Engineering Saitama Institute Of Technology
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