High Resolution Double Layer Resist System Using New Silicone Based Negative Resist (SNR)
スポンサーリンク
概要
- 論文の詳細を見る
We propose a new silicone based negative resist (SNR) for a high resolution double layer resist system. SNR shows high sensitivity to an e-beam, D_<0.5>=5 μC/cm^2, with high contrast γ=2, and excellent resistance to reactive ion etching under oxygen gas. A submicron pattern with a high aspect ratio can be easily fabricated with the SNR/AZ double layer resist system. It is also shown that submicron lithography can be accomplished on a substrate with topographic features.
- 社団法人応用物理学会の論文
- 1983-10-20
著者
-
Morita Masao
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
Imamura Saburo
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
Tanaka Akinobu
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
TAMAMURA Toshiaki
Polymer Section, Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public
-
KOGURE Osamu
Polymer Section, Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public
-
Tamamura Toshiaki
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
Kogure Osamu
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
Morita Masao
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
-
Imamura Saburo
Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co
関連論文
- High Resolution Double Layer Resist System Using New Silicone Based Negative Resist (SNR)
- Chloromethylated Polystyrene as Deep UV and X-Ray Resist
- New Photoresist for High Resolution Two-Layer Resist Systems