Chloromethylated Polystyrene as Deep UV and X-Ray Resist

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概要

• 論文の詳細を見る

• The deep uv and X-ray lithographic characteristics of high-performance negative electron resist chloromethylated polystyrene (CMS) were investigated. The sensitivity and resolution of a series of CMS's synthesized from nearly monodispersed polystyrene were evaluated as functions of molecular parameters. In CMS with a molecular weight of 1.8×10^5 showing a resolution better than 1.5 μm, a high sensitivity of 29 mJ/cm^2 to X-rays and a sensitivity to deep uv about 40 times higher than that of PMMA was achieved. This high sensitivity is attributed to the high reactivity of the chloromethyl group, as verified by the high G value of CMS (5.4), 50 times larger than that of polystyrene. In contrast to most negative resists, where oxygen in air depresses the sensitivity, the sensitivity of CMS is hardly affected by the atmosphere. The sensitivity and resolution in the deep uv system are particularly affected by light absorption, because CMS exhibits strong absorption between 200 to 300 nm.

• 社団法人応用物理学会の論文
• 1982-05-20

著者

• Imamura Saburo

  Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co

• Sugawara Shungo

  Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co

• Sugawara Shungo

  Polymer Section Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Co

関連論文

• High Resolution Double Layer Resist System Using New Silicone Based Negative Resist (SNR)
• A New High Resolution Negative Electron Resist Chloromethylated Poly-α-Methylstyrene (αM-CMS)
• Chloromethylated Polystyrene as Deep UV and X-Ray Resist

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