Small Angle X-Ray Reflection and Conductivity of Ni Films Prepared by Jon Beam Sputtering and Electron Beam Deposition
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概要
- 論文の詳細を見る
The precise thickness of Ni films prepared by ion beam sputtering (IBS) and electron beam deposition (EBD) was measured by a small angle X-ray reflection technique and the sheet resistance of these films was measured by the van der Pauw method. It is concluded that the IBS films have a much smaller crystalline grain size in growth structure and hence, a lower conductivity (17% of bulk value), and a slightly lower density (87% of X-ray density) as compared with the EBD films.
- 社団法人応用物理学会の論文
- 1998-05-15
著者
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Mizoguchi Tadashi
Graduate School Of Pharmaceutical Sciences Osaka University
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Inamura Ryosaku
Fuculty Of Science Gakushuin University
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YAMAUTI Kazushi
Sony Corporation
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MIZOGUCHI Tadashi
Fuculty of Science, Gakushuin University
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Mizoguchi Tadashi
Fuculty Of Science Gakushuin University
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