Dry Oxidation Study on CVD-SiO_2/Thermal-SiO_2/Si Structure

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-12-20

著者

• Ueda J

  Kyoto Inst. Technol. Kyoto Jpn

• Nishi Kenji

  OKI Electric Industry Co., Ltd.

• KURODA Shigeki

  Oki Electric Industry Co., Ltd.

• UEDA Jun

  Oki Electric Industry Co., Ltd.

• Kuroda Shigeki

  Oki Electric Industry Co. Ltd.

• Nishi Kenji

  Oki Electric Industry Co. Ltd.

関連論文

• Systematic Yield Simulation Methodology Applied to Fully-Depleted SOI MOSFET Process (Special lssue on SISPAD'99)
• Inverse Modeling and Its Application to MOSFET Channel Profile Extraction (Special Issue on TCAD for Semiconductor Industries)
• Dry Oxidation Study on CVD-SiO_2/Thermal-SiO_2/Si Structure
• Reactor Dismantling by Abrasive Water Jet Cutting System

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