Thin Film Fabrication of Bi_2(Sr, Ca)_2CuO_x Phase at Temperatures between 450 and 650℃ by Plasma-Assisted Ion Beam Sputtering

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Thin Film Fabrication of Bi_2(Sr, Ca)_2CuO_x Phase at Temperatures between 450 and 650℃ by Plasma-Assisted Ion Beam Sputtering
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