Observation of Deep Level in p-n Junction Diode of 6H:SiC
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概要
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We have investigated the deep level trap centers in a p-n junction diode of 6H:SiC by deep level transient spectroscopy (DLTS) measurements. An electron trap center 0.71 eV below the conduction band edge is observed for the first time in 6H:SiC. The estimated trap center concentration and its capture cross section are found to be around 2×10^<15> cm^<-3> and 5×10^<-14> cm^2, respectively. The trap center concentration profile is found to be uniform. The origin of trap centers is suggested.
- 社団法人応用物理学会の論文
- 1993-11-15
著者
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UDDIN Ashraf
Materials and Devices Research Laboratories, R&D Center, Toshiba Corporation
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UEMOTO Tsutomu
Materials and Devices Research Laboratories, R&D Center, Toshiba Corporation
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Uddin Ashraf
Materials And Device Research Laboratories R&d Center Toshiba Corporation
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Uemoto Tsutomu
Materials And Device Research Laboratories R&d Center Toshiba Corporation
関連論文
- Trap Centers in Germanium-Implanted and in As-Grown 6H-SiC
- Observation of Deep Level in p-n Junction Diode of 6H:SiC
- Investigation of Deep Levels and Residual Impurities in Sublimation-Grown SiC Substrates