Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography : Lithography Technology
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-01-31
著者
-
Huber H.-l.
Fraunhofer-institut Fur Mikrostrulturtechnik Dillenbutger Str
-
Huber H‐l
Fraunhofer Institut For Siliziumtechnologie (isit)
-
Grimm J.
Fraunhofer-institut Fur Mikrostrulturtechnik Dillenbutger Str
-
CHLEBEK Jurgen
Fraunhofer Institut fur Siliziumtechnologie (ISiT-Berlin)
-
LOCHEL B.
Fraunhofer-Institut fur Mikrostrulturtechnik, Dillenbutger Str
-
CHLEBEK J.
Fraunhofer-Institut fur Mikrostrulturtechnik, Dillenbutger Str
-
MACIOBEK A.
Fraunhofer-Institut fur Mikrostrulturtechnik, Dillenbutger Str
-
Lochel B.
Fraunhofer-institut Fur Mikrostrulturtechnik Dillenbutger Str
-
Maciobek A.
Fraunhofer-institut Fur Mikrostrulturtechnik Dillenbutger Str
関連論文
- Process Latitude for Sub-200-Nanometer Synchrotron Orbital Radiatiorn X-Ray Lithography
- High-Performance Pattern Placement Metrology on Dynamic Random Access Memory Layers of 0.25 μm Technology
- Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography : Lithography Technology
- Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography