Process Latitude for Sub-200-Nanometer Synchrotron Orbital Radiatiorn X-Ray Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-12-30

著者

• Weib Manfred

  Fraunhofer Institut Fur Siliziumtechnologie (isit-berlin)

• Oertel Heinrich

  Fraunhofer Institut Fur Siliziumtechnologie (isit-berlin)

• CHLEBEK Jurgen

  Fraunhofer Institut fur Siliziumtechnologie (ISiT-Berlin)

関連論文

• Process Latitude for Sub-200-Nanometer Synchrotron Orbital Radiatiorn X-Ray Lithography
• Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography : Lithography Technology
• Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography

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