Characterization of Amorphous Silicon Barriers in Nb_3Ge Josephson Tunnel Junctions
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1986-02-20
著者
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Kuriki S
Research Institute Of Applied Electricity Hokkaido University
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Konishi Hajime
Research Institute Of Applied Electricity Hokkaido University
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Kuriki Shinya
Research Institule Of Applied Electricity Hokkaido Universitiy
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NOVA Atsushi
Department of Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology
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Nova Atsushi
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Technology
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