Negative Resistance in Al_xGa_<1-x>As:Si Red Light-Emitting Diodes
スポンサーリンク
概要
- 論文の詳細を見る
A negative resistance is directly observed near 77 K in Si-doped Al_xGa_<1-x>As diodes with a P-P゜-N structure. A strong emission at the P゜-P boundary originating from the recombination barrier is also directly observed. The negative resistance can be explained by the trap-filling mechanism.
- 社団法人応用物理学会の論文
- 1988-06-20
著者
-
PARK Seounghwan
Department of Physics, Hyosung Women's University
-
Choe Byungdoo
Department Of Physics Seoul National University
-
JANG Seongjoo
Department of Physics, Chonnam National University
-
Jang Seongjoo
Department Of Physics Chonnam National University
-
Park Seounghwan
Department Of Physics Seoul National University
-
Park Seounghwan
Department Of Physics Hyosung Women's University
関連論文
- Optimization of Threshold Current Density for Compressive-Strained InGaAs/GaAs Quantum Well Lasers
- A Method for Studying the Electric Field Enhanced Emission of Carriers from Deep Levels
- Negative Resistance in Al_xGa_As:Si Red Light-Emitting Diodes
- Origin of the Long-Wavelength-Side Peakin Al_xGa_As:Si Light-Emitting Diodes
- Semi-Insulating P0-Region in Si-Doped GaAs Diodes