Measurement of Optical Activity using a Photoelastic Modulator System
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概要
- 論文の詳細を見る
Adjusting the analyzer at 90° to the strain axis of a photoelastic modulator, one can determine the optical activity by measuring the slope of its DC intensity distribution under various phase modulation amplitudes. This technique was applied to measure the ellipticity of few quartz quarter-wave plates and the optical rotation of an optical active crystal. A multiple reflection enhancement effect in the wave plate was observed and discussed. By considering the photoelastic modulator as an elliptical retarder, we also determined its intrinsic ellipticity and static phase retardation, to increase the accuracy of measurements.
- 社団法人応用物理学会の論文
- 1999-02-15
著者
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Chao Yu-faye
Institute Of Electro-optical Engineering National Chiao Tung University
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Wang Charn-kuo
Institute Of Electro-optical Engineering National Chiao Tung University
関連論文
- Azimuth Alignment in Photoelastic Modulation Ellipsometry at a Fixed Incident Angle(Instrumentation, Measurement, and Fabrication Technology)
- A Direct Determination Technique for Azimuth Alignment in Photoelastic Modulation Ellipsometry
- Measurement of Optical Activity using a Photoelastic Modulator System
- Direct Determination of Azimuth Angles in Photoelastic Modulator System
- Calibrations of Phase Modulation Amplitude of Photoelastic Modulator