Azimuth Alignment in Photoelastic Modulation Ellipsometry at a Fixed Incident Angle(Instrumentation, Measurement, and Fabrication Technology)

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概要

• 論文の詳細を見る

• A high intensity ratio technique is proposed to align all the azimuthal angles of a photoelastic modulation ellipsometric system in a fixed incident angle. This technique is used to determine the azimuthal orientations of the polarizer, the photoelastic modulator and the analyzer to the incident plane. Two pre-designed testing samples and two probing wavelengths for a thin film are introduced to locate the incident plane by the intensity ratio technique in a polarizer-sample-analyzer ellipsometric setup. Then, the azimuth of the photoelastic modulator is directly obtained from two DC radiances separated by 45°. In addition to azimuth deviation, the ellipsometric parameter ψ can also be determined from the same measurement for determining the incident angle on-line.

• 社団法人応用物理学会の論文
• 2002-06-15

著者

• Wang M‐w

  National Chiao Tung Univ. Hsinchu Twn

• Wang Meng-wei

  Institute Of Electro-optical Engineering National Chiao Tung University

• Chao Yu-faye

  Institute Of Electro-optical Engineering National Chiao Tung University

関連論文

• Azimuth Alignment in Photoelastic Modulation Ellipsometry at a Fixed Incident Angle(Instrumentation, Measurement, and Fabrication Technology)
• A Direct Determination Technique for Azimuth Alignment in Photoelastic Modulation Ellipsometry
• Measurement of Optical Activity using a Photoelastic Modulator System
• Direct Determination of Azimuth Angles in Photoelastic Modulator System
• Calibrations of Phase Modulation Amplitude of Photoelastic Modulator

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