Stress Characteristics of Multilayered Polysilicon Film for the Fabrication of Microresonators
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-06-15
著者
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Jang Won
Telecommunication Basic Research Laboratory Electronics And Telecommunications Research Institute
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Lee Jong
Telecommunication Basic Research Laboratory Electronics And Telecommunications Research Institute
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Choi Chang
Telecommunication Basic Research Laboratory Electronics And Telecommunications Research Institute
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Lee J
Hynix Semiconductor Inc. Chungchongbuk‐do Kor
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LEE Chang
Telecommunication Basic Research Laboratory, Electronics and Telecommunications Research Institute
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HONG Yoon
Telecommunication Basic Research Laboratory, Electronics and Telecommunications Research Institute
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SOHN Byung
School of Electronics and Electrical Engineering, Kyungbook National University
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Hong Yoon
Telecommunication Basic Research Laboratory Electronics And Telecommunications Research Institute
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Sohn Byung
School Of Electronics And Electrical Engineering Kyungbook National University
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Lee Chang
Telecommunication Basic Research Laboratory Electronics And Telecommunications Research Institute
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- Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining
- Stress Characteristics of Multilayered Polysilicon Film for the Fabrication of Microresonators
- Low-Voltage Operating Triode-Type Field Emission Displays Controlled by Amorphous-Silicon Thin-Film Transistors