Cross-Contamination from Etching Materials in Reactive Ion Etcher

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-05-15

著者

• Ozaki Yoshiharu

  Ntt System Electronics Laboratories

• OZAKI Yoshiharu

  NTT, System Electronics Laboratories

• KIMIZUKA Masakatsu

  NTT, System Electronics Laboratories

• Kimizuka Masakatsu

  Ntt System Electronics Laboratories

関連論文

• Low-Pulse-Energy Excimer-Laser-Induced Damage in Thermally Oxidized Si(100) Substrates
• Cross-Contamination from Etching Materials in Reactive Ion Etcher
• Cross-Contamination from Etching Materials in Reactive Ion Etcher

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