Impurity Diffusion in Silicon Based on the Pair Diffusion Model and Decrease in Quasi-Vacancy Formation Energy. Part Two : Arsenic

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-01-15

著者

• Arai Eisuke

  Ntt Lsi Laboratories

• YOSHIDA Mtasayuki

  Kyushu Insitute of Design

• Yoshida Mtasayuki

  Kyushu Insitute Of Design:(present Address)yoshida Semiconductor Laboratory

関連論文

• Impurity Diffusion in Silicon Based on the Pair Diffusion Model and Decrease in Quasi-Vacancy Formation Energy. Part Two : Arsenic
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• LSI Delivery Management System Using Lot Sampling Scheduling Method for ASIC Production Line
• Impurity Diffusion in Silicon Based on the Pair Diffusion Model and Decrease in Quasi-Vacancy Formation Energy. Part One: Phosphorus
• An On-Line Scheduler for ASIC Manufacturing Line Management
• A Flexible and Low-Cost ASIC Line Management Technology Taking Operator's Skill-Level as a Scheduling-Factor into Consideration
• A Scalable and Flexible CIM System with Precise and Quick Scheduler for ASIC

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