Theoretical Study of Step Coverage and Comparison with Experimental Results from Low Pressure Chemical Vapor Deposition Process of Tungsten Film

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-06-15

著者

• Park S‐k

  Korea Inst. Sci. And Technol. Seoul Kor

• Yun Jong-ho

  Laboratory For Advanced Materials Processing (lamp) Department Of Chemical Engineering Pohang Univer

• Park Sung-kun

  Department Of Electronic Engineering Kyungpook National University

• PARK Sang-Kyu

  Laboratory for Advanced Materials Processing (LAMP), Department of Chemical Engineering, Pohang Univ

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