Electron Spectroscopy for Chemical Analysis Study on Influence of Polymerization on Anisotropic Etching of Thick Silicon Oxide Using C_2F_6 Based ECM-RIBE

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-03-15

著者

• Dutta A

  Opto-electronics Research Laboratories Nec Corporation

• Dutta Achyut

  Opto-Electronics Research Laboratories, NEC Corporation

• Dutta Achyut

  Opto-electronics Research Laboratories Nec Corporation

関連論文

• Electron Spectroscopy for Chemical Analysis Study on Influence of Polymerization on Anisotropic Etching of Thick Silicon Oxide Using C_2F_6 Based ECM-RIBE
• Prospects of Vertical and Smooth Etching of Thick Silicon Oxide for Opto-Electronics Integration
• Side Wall Roughness Reduction in Deep Silicon Oxide Etching Using C_2F_6 Based ECR-RIBE

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