Effect of Annealing in Air on Electrical Resistances of B-Doped Polycrystalline Diamond Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-08-15

著者

• Miyata K

  Kobe Steel Ltd. Kobe Jpn

• Miyata Koichi

  Kobe Steel Ltd. Electronics And Information Technology Laboratory

• DREIFUS David

  Kobe Steel USA Inc., Electronic Materials Center

• Dreifus D

  Kobe Steel Usa Inc. Electronic Materials Center

関連論文

• Kinetics of Radicals in CF_4 and C_4F_8 Electron Cyclotron Resonance Plasmas
• CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
• Stability of Field Emission Current from Boron-Doped Diamond Thin Films Terminated with Hydrogen and Oxygen
• Effect of Annealing in Air on Electrical Resistances of B-Doped Polycrystalline Diamond Films
• Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma

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