X-Ray Photoelectron Spectroscopy and X-Ray Absorption Near Edge Structure Study of Structural Change of Perhydropolysilazane to Silicon Nitride by Heat Treatment

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概要

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• We studied the structural change of perhydropolysilazane to silicon nitride during the process of heat treatment by means of in situ X-ray absorption near-edge structure (XANES) and X-ray photoelectron spectroscopy (XPS), together with Fourier transformed infra-red (FT-IR) and temperature programmed desorption (TPD) spectroscopies. It was revealed that nucleophilic attack on silicon atoms in the polymer began to proceed above 200℃, by nitrogen atoms in the polymer itself and also in atmospheric ammonia. From 400℃ to 600℃, dehydrogenation also occurred and produced dangling bonds which were attacked by ammonia molecules to form the network of SiN_4 tetrahedra. Although oxidation by residual moisture was observed to some extent at 600℃, further heat treatment in ammonia formed Si-N bonds via replacement of oxygen atoms by nitrogen atoms to complete the formation of Si_3N_4-like structure.

• 社団法人応用物理学会の論文
• 1994-06-15

著者

• Ohta Toshiaki

  Department Of Chemistry Faculty Of Science University Of Tokyo

• YOKOYAMA Yasuharu

  Corporate Research & Development Laboratory, Toa Nenryo Kogyo K. K.

• Yokoyama Yasuharu

  Corporate Research & Development Laboratory Tonen Corporation

• Ohta Toshiaki

  Department Of Materials Science Faculty Of Science Hiroshima University:department Of Chemistry Grad

• HORIUCHI Kazunaga

  Department of Materials Science, Faculty of Science, Hiroshima University

• MAESHIMA Tsugio

  Corporate Research & Development Laboratory, Tonen Corporation

• Horiuchi Kazunaga

  Department Of Materials Science Faculty Of Science Hiroshima University:(present Address)corporate R

• Maeshima Tsugio

  Corporate Research & Development Laboratory Tonen Corporation

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