Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-06-15
著者
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Nakajima H
Waseda Univ. Tokyo Jpn
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SATAKE Tetsuya
Central Research Laboratory, Mitsubishi Electric Corporation
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SORITA Tetsuji
Central Research Laboratory, Mitsubishi Electric Corporation
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FUJIOKA Hirofumi
Central Research Laboratory, Mitsubishi Electric Corporation
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ADACHI Hiroshi
Central Research Laboratory, Mitsubishi Electric Corporation
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NAKAJIMA Hiroyuki
Central Research Laboratory, Mitsubishi Electric Corporation
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Sorita Tetsuji
Central Research Laboratory Mitsubishi Electric Corporation
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Fujioka H
Kyocera Corp. Kokubu Jpn
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Satake T
Advanced Technology R & D Center Mitsubishi Electric Corporation
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Adachi Hiroshi
Central Research Laboratory Mitsubishi Electric Corporation
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Nakajima H.
System Electronics Laboratories, Nippon Telegraph and Telephone Corporation
関連論文
- Pressure Effects on NMR and PQR Properties of CeCu_6 and CeCu_2Si_2 : II. LOW TEMPERATURE PROPERTIES OF SOLIDS : Heavy Electrons : Experiments
- Detection of Intermediates in Thermal Chemical Vapor Deposition Process Using Tetraethoxysilane
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- Dependence of In-Plane Anisotropy in Polyimide Langmuir-Blodgett Films on Molecular Weight of Polyamic Acid
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