Preparation of MgO Thin Films by RF Magnetron Sputtering
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概要
- 論文の詳細を見る
MgO thin films were prepared on Si (100) substrates by RF magnetron sputtering using a Mg, or MgO target. The preferred orientation of MgO thin films using a Mg target was transformed from a (200) plane to a (111) plane as a function of substrate temperature. The preferred orientation of MgO thin films using a MgO target was observed only in the (200) plane.
- 社団法人応用物理学会の論文
- 1991-05-15
著者
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Yamashita Tsutomu
Department Of Electronics Nagaoka University Of Technology
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MIKOSHIBA Nobuo
Hewlett Packard Laboratories
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Kaneko Yasuhisa
Department Of Electrical Engineering Technological University Of Nagaoka
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Kaneko Yasuhisa
Department Of Electronics Nagaoka University Of Technology:(present Address)hewlett-packard Laborato
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Mikoshiba Nobuo
Hewlett-packard Laboratories Japan
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Yamashita Tsutomu
Department Of Electrical Engineering Technological University Of Nagaoka
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