MIKOSHIBA Nobuo | Hewlett Packard Laboratories
スポンサーリンク
概要
関連著者
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MIKOSHIBA Nobuo
Hewlett Packard Laboratories
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Mikoshiba Nobuo
Hewlett-packard Laboratories Japan
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NAKAGAWA Shigeru
Hewlett-Packard Laboratories
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YAMADA Norihide
Hewlett-Packard Laboratories
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KANEKO Yasuhisa
Hewlett-Packard Laboratories Japan
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Yamashita Tsutomu
Department Of Electronics Nagaoka University Of Technology
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Yamada N
Av Core Technology Development Center Matsushita Electric Industrial Co. Ltd.
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Yamada N
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Saitoh M
The Department Of Electronic Engineering The University Of Tokyo
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Nakagawa S
Hewlett‐packard Lab. Kanagawa Jpn
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ICHIMURA Yoshikatsu
Hewlett-Packard Laboratories
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TAKEUCHI Tetsuya
Hewlett Packard Laboratories
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Kaneko Y
Hewlett-packard Laboratories
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Kaneko Yasuhisa
Department Of Electrical Engineering Technological University Of Nagaoka
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Kaneko Yasuhisa
Department Of Electronics Nagaoka University Of Technology:(present Address)hewlett-packard Laborato
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Yi You-wen
Hewlett-packard Laboratories Japan
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Yamada N
Yonezawa Women's College Of Yamagata Prefecture
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Yamashita Tsutomu
Department Of Electrical Engineering Technological University Of Nagaoka
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Yagi Takaaki
Hewlett-Packard Laboratories Japan
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Saitoh Mitsuchika
Hewlett-Packard Laboratories Japan
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Aoki Takeshi
Department Of Drug Safety Res. Eisai Co. Ltd.
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Fukasawa Kazuaki
Department of Electronic Engineering, Faculty of Engineering, Tokyo Institute of Polytechnics,
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Nishikawa Yasuo
Department of Electronic Engineering, Faculty of Engineering, Tokyo Institute of Polytechnics,
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Kaneko Yasuhisa
Hewlett-Packard Laboratories
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Aoki Takeshi
Department of Electronic Engineering, Faculty of Engineering, Tokyo Institute of Polytechnics,
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Mikoshiba Nobuo
Hewlett-Packard Laboratories Japan, Sakado, Kawasaki 213, Japan
著作論文
- Second-Harmonic Generation in Vertical-Cavity Surface-Emitting Laser
- A Novel Effective-Channel-Length/External-Resistance Extraction Method for Small-Geometry MOSFET's
- Preparation of MgO Thin Films by RF Magnetron Sputtering
- Novel Impedance-Matching Method for Plasma Processing at Very High Frequency Band