Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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Hosono Kunihiro
Lsi Laboratory Mitsubishi Electric Corporation
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NAGAMURA Yoshikazu
LSI Laboratory, Mitsubishi Electric Corporation
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KUSUNOSE Haruhiko
LSI Laboratory, Mitsubishi Electric Corporation
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YOSHIOKA Nobuyuki
LSI Laboratory, Mitsubishi Electric Corporation
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WATAKABE Yaichiro
LSI Laboratory, Mitsubishi Electric Corporation
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AKASAKA Yoichi
LSI Laboratory, Mitsubishi Electric Corporation
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Akasaka Yoichi
Lsi Laboratory Mitsubishi Electric Corporation
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Watakabe Yaichiro
Lsi Laboratory Mitsubishi Electric Corporation
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Yoshioka Nobuyuki
Lsi Laboratory Mitsubishi Electric Corporation
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Nagamura Yoshikazu
Lsi Laboratory Mitsubishi Electric Corporation
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Kusunose Haruhiko
Lsi Laboratory Mitsubishi Electric Corp.
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Kusunose Haruhiko
Lsi Laboratory Mitsubishi Electric Corporation
関連論文
- Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process
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- Novel Electron Beam Direct Writing Technique for the Hole Pattern of Quarter-Micron Devices
- Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
- Dynamic Thermal Response of Photomasks Caused by Excimer Laser Pulse