Novel Electron Beam Direct Writing Technique for the Hole Pattern of Quarter-Micron Devices
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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WATAKABE Yaichiro
LSI Laboratory, Mitsubishi Electric Corporation
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AKASAKA Yoichi
LSI Laboratory, Mitsubishi Electric Corporation
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FUJINO Takeshi
LSI Laboratory, Mitsubishi Electric Corporation
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Ishii Atsushi
Lsi Laboratory Mitsubishi Electric Corporation
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Nakao Shuji
Lsi Laboratory Mitsubishi Electric Corporation
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Matsuba Motoko
Central Research Laboratory Mitsubishi Electric Corporation
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Akasaka Yoichi
Lsi Laboratory Mitsubishi Electric Corporation
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KAWAI Kenji
LSI Laboratory, Mitsubishi Electric Corporation
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Fujino Takeshi
Lsi Laboratory Mitsubishi Electric Corporation
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Watakabe Yaichiro
Lsi Laboratory Mitsubishi Electric Corporation
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Kawai Kenji
Lsi Laboratory Mitsubishi Electric Corporation
関連論文
- Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Novel Electron Beam Direct Writing Technique for the Hole Pattern of Quarter-Micron Devices
- Dynamic Thermal Response of Photomasks Caused by Excimer Laser Pulse