Structure and Electrical Properties of Thin Oxide Film Diode with Sputtered Titanium Base
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1967-07-05
著者
-
Hayakawa Shigeru
Wireles Research Laboratory Matsushita Electric Industrial Co. Ltd.
-
Ikushima Hiroshi
Wireles Research Laboratory Matsushita Electric Industrial Co. Ltd.
関連論文
- RF-Sputtered n-p Heterojunction Diodes of ZnSe-Si and ZnSe-GaAs
- Electrical Properties of Mixed Oxide Film of PbO and TiO_2
- Dielectric Properties of PbO Thin Films
- Electrical and Optical Properties of Sputtered n-p ZnO-Si Heterojunctions
- Bistable Switching of ZnO Thin Film Diodes
- A Current Instability in TiO_2 Thin Film
- Electron Spin Resonance of Mn^ in Lead Titanate
- Observation of Chladni Figures in Piezoelectric Ceramic Plates of Rectangular Form
- Electron Spin Resonance of Mn^ in Reduced BaTiO_3 Single Crystals
- Structure and Electrical Properties of Thin Oxide Film Diode with Sputtered Titanium Base