Properties of a Photoresist Film as an Insulating Layer
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概要
- 論文の詳細を見る
A novel technology for interlayer insulation is proposed, where photopolymerizable pohotoresist (cyclized polybutadiene) is utilized. Direct patterning of the insulating film is possible and the film is stable at least up to 300℃, therefore, the microfabrication process is very much simplified.
- 社団法人応用物理学会の論文
- 1980-08-05
著者
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Ito Hideo
Origin Electric Co., Ltd.
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Mizushima Yoshihiko
Electrical Communication Laboratories Nippon Telegraph And Telephone Public Corporation
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Takada Akitsu
Electrical Communication Laboratories Nippon Telegraph And Telephone Public Corporation
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Ito Hideo
Origin Electric Co. Ltd.
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MIZUSHIMA Yoshihiko
Electrical Communication Laboratories
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