Effect of Platinum Particles in Dual SiO_2 Interface on Charge Storage Properties

スポンサーリンク

概要

• 論文の詳細を見る

• The charge storage properties of the Metal-Oxide-Metal particles-Oxide-Semiconductor structure, in which charge storage traps are introduced by interposing metal particles between CVD SiO_2. and thermally grown Si0_2, have been investigated. As metal particles, Pt evaporated by electron beam has been used. The distinct effect of Pt particles on the charge storage properties has been observed, compared to the properties of the Metal-Oxide-Oxide-Semiconductor structure. The amount of the flat-band voltage shift and the retention time are changed with the heat treatment condition in the 0_2 atmosphere after the CVD Si0_2 deposition upon metal particles. This is explained by the growth of SiO_2 on Si by the heat treatment in 0_2, which is clarified by structural analysis by means of Auger electron spectroscopy.

• 社団法人応用物理学会の論文
• 1977-03-05

著者

• Yoshino Hideo

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• Yashiro Takehisa

  Musashino Electrical Communication Labortztory Nippon Telegraph And Telephone Public Corporation

• Yashiro Takehisa

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• KIUCHI Kazuhide

  Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

• Kiuchi Kazuhide

  Musashino Electrical Communication Labortztory Nippon Telegraph And Telephone Public Corporation

• YOSHINO Hideo

  Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation

関連論文

• MOS LSI Fabrication Process using Direct Electron Beam Writing : A-6: ELECTRON BEAM TECHNOLOGY
• Oxidized Porous Silicon-Silicon Interface Investigation by C-V Method
• Surface State Formation during Long-Term Bias-Temperature Stress Aging of Thin SiO_2-Si Interfaces
• Properties of MNMOS Structure Interposing Platinum at Si_3N_4-SiO_2 Interface
• Effect of Platinum Particles in Dual SiO_2 Interface on Charge Storage Properties

スポンサーリンク