An Investigation of Stability of p-Channel Ion-Implanted MOS Transistors by BT Treatments
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1973-10-05
著者
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Nakamura Kunio
Ic Division Nippon Electric Co. Ltd.
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Kamoshida Mototaka
Ic Division Nippon Electric Co. Ltd.
関連論文
- An Investigation of Stability of p-Channel Ion-Implanted MOS Transistors by BT Treatments
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