Measurements of Aluminum X-Ray Emission Bands Shift by EPMA
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1970-11-05
著者
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Maruno Shigeo
Material Research Laboratory Nagoya Institute Of Technology
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FUJII Sueo
Material Research Laboratory, Nagoya Institute of Technology
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Fujii Sueo
Material Research Laboratory Nagoya Institute Of Technology
関連論文
- Switching Phenomena in the Glasses of the System Ge_Se_Te_x
- Effect of Substrate Temperature on Electrical Properties of Amorphous Germanium Films
- Electrical Properties of As_2S_3-Ag Glasses
- Diffusion of Metals in Arsenic Trisulfide Glass Films
- Formation of Negative Resistance Path in Amorphous Germanium Thin Film
- Measurements of Aluminum X-Ray Emission Bands Shift by EPMA
- Photodoping Sensitivity of Ag into Amorphous Ge_S_ Films