Formation of Negative Resistance Path in Amorphous Germanium Thin Film

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1970-11-05

著者

• Noda Mikio

  Material Research Laboratory Nagoya Institute Of Technology

• MARUNO Shigeo

  Material Research Laboratory, Nagoya Institute of Technology

• YAMADA Toshio

  Material Research Laboratory, Nagoya Institute of Technology

• Maruno Shigeo

  Material Research Laboratory Nagoya Institute Of Technology

• Yamada Toshio

  Material Research Laboratory Nagoya Institute Of Technology

関連論文

• Switching Phenomena in the Glasses of the System Ge_Se_Te_x
• Effect of Substrate Temperature on Electrical Properties of Amorphous Germanium Films
• Electrical Properties of As_2S_3-Ag Glasses
• Diffusion of Metals in Arsenic Trisulfide Glass Films
• Formation of Negative Resistance Path in Amorphous Germanium Thin Film
• Measurements of Aluminum X-Ray Emission Bands Shift by EPMA
• Photodoping Sensitivity of Ag into Amorphous Ge_S_ Films

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