Effect of H2 Plasma on Ni/Fe Alloy Substrate for Carbon Nanotubes Growth (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)

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We report the characteristics of carbon nanotubes by MPCVD(Micro Plasma Chemical Vapor Deposition) under variable treatment time of H_2 plasma on Ni/Fe alloy substrate at room temperature. The surface of Ni/Fe alloy was transformed into Ni droplets by H_2 plasma treatment whose diameter were 10〜250nm, and carbon tubes were grown well by increasing H_2 plasma treatment time. It was confirmed that the size of Ni droplet suitable for carbon nanotubes growth is limited to around 20〜30nm. The TEM images show straight carbon nanotubes with uniform diameter. The outside and inside diameter of the carbon nanotubes are 30〜50nm and 5〜7nm, respectively. About 30 sheets of graphite layers can be clearly seen. The turn-on field is decreased from 3.5 to 0.5V/μm by increasing plasma time and the emission current density is increased from 2x10^<-6> to 2x10^<-2> by increasing plasma time.
2000-10-20