Characterization of Metallic Materials by Atom Probe Field Ion Microscopy

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概要

• 論文の詳細を見る
• 社団法人溶接学会の論文
• 1992-12-05

著者

• Sakurai T.

  Institute of Industrial Science

• Hono K.

  Institute For Materials Research (imr) Tohoku University

• Babu S.

  Institute For Materials Research (imr) Tohoku University

• Babu S.S.

  Institute for Materials Research (IMR), Tohoku University

関連論文

• Short Channel Effect on Variable Threshold Voltage CMOS(VTCMOS)
• Short Channel Effect on Variable Threshold Voltage CMOS(VTCMOS)
• A Mechanism of 13% Lattice Expansion in C_ FCC(110) Thin Films Grown on the GaAs(001) As-rich Surface
• Optimum Device Parameters and Scalability of Variable Threshold CMOS (VTCMOS)
• Characterization of Metallic Materials by Atom Probe Field Ion Microscopy

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